|
Press Releases
Los Angeles, April 12, 2004 —
Surfx Technologies has signed a Cooperative Research
and Development Agreement (CRADA) with Honeywell Federal Manufacturing & Technologies,
LLC, operator of the National Nuclear Security Administration’s Kansas City Plant (KCP) to develop advanced atmospheric plasma processes
for depositing functional coatings onto manufactured parts. These processes will be developed using Surfx’s unique Atomflo™-D plasma
coating tool. Honeywell FM&T has a number
of applications that would benefit from the deposition of thin films for enhanced dielectric
strength, lubricity, or wear resistance.
The atmospheric plasma tool will allow Honeywell FM&T to conveniently coat 3D parts with novel
materials and at low temperatures that
will not damage any sensitive components.
According to the responsible Project Engineer at Honeywell, "Surfx’s unique plasma tools have allowed us to significantly
expand the materials engineering services we provide the NNSA at the KCP. We already use their atmospheric plasmas for cleaning, etching
and surface activation, and the development of an advanced deposition process will add an important new capability to our tool set. We
look forward to working with Surfx on this project.” Bob Hicks, Chief Executive Officer of Surfx Technologies, states, “We greatly value
our relationship with Honeywell FM&T and are excited to participate with them on the development of new atmospheric plasma coating
technologies.”
Los Angeles, March 22, 2004 —
Surfx Technologies has received a major order for a plasma coating tool from a Fortune 500 specialty chemicals and plastics company. This
is further proof that our company is recognized as a world leader in plasma technology. Joel Penelon, Direct or Marketing, states, “Plastic
products are pervasive in consumer goods. Many of these would benefit from hard coatings that can protect them from damage during use.
In addition to abrasion resistance, nanoscale coatings provide other functionalities that significantly enhance the performance of plastics.
We expect our atmospheric plasma tools to play a big role in enabling these emerging applications.”
Los Angeles, March 17, 2004 —
Surfx Technologies has been awarded a phase I Small Business Innovation Research (SBIR) contract from the U.S. Air Force. The award is for
“Environmentally Friendly, On-Aircraft Repair of Polyether-etherketone (PEEK) Thermoplastic Components.” Surfx will develop and demonstrate
atmospheric plasma processes for activating the surface of carbon-fiber-reinforced PEEK prior to adhesive bonding. The company’s rugged
handheld device is easily deployed in the field, and can treat the surface of any object, regardless of size and shape. Surfx will conduct
this project in collaboration with the University of Delaware Center for Composite Materials (CCM), which is recognized as one of the premier
research facilities in the world for this technology.
“We are really excited to work with the Air Force and the Delaware Center for Composite Materials on atmospheric plasma
applications for fighter aircraft,” said Steve Babayan, President of Surfx Technologies. Professor John W. Gillespie, Jr., Director of the
CCM, states “I welcome the opportunity to participate in the evaluation of this new technology for bonding and repair of PEEK composites, and
feel that it has the potential to revolutionize aircraft repair.”
News
On June 28th and 29th 2004, Greg Nowling and Xiawan Yang, Ph.D. candidates in Dr. Hicks' group
at UCLA, gave talks on "Atmospheric Plasma Deposition of Abrasion Resistant Coatings on Plastic" and "Properties of a Non-Equilibrium
Atmospheric Pressure Plasma" at the 31st IEEE International Conference on Plasma Science, Baltimore, MD.
In June 2003, we moved into new facilities. Come visit us at 3617 Hayden Avenue, Culver City, CA.
Literature
Send us an e-mail
if you wish to receive copies of any of the
papers listed below. Indicated the paper number and a copy will be emailed to you in Adobe® Acrobat® format (.pdf).
1. Surfx's "Application Notes" describing operating principles and uses of atmospheric pressure plasma sources, September, 2003.
2. The atmospheric-pressure plasma jet: a review and comparison to other plasma sources
Andreas Schütze, James Y. Jeong, Steven E. Babayan, Jaeyoung Park, Gary S. Selwyn, and Robert F. Hicks
IEEE Transactions on Plasma Science, vol. 26, December 1998, page 1685.
3. Reaction chemistry in the afterglow of an oxygen-helium, atmospheric-pressure plasma
James Y. Jeong, Jaeyoung Park, Ivars Henins, Steven E. Babayan, Vincent J. Tu, Gary S. Selwyn, Guowen Ding, and Robert F. Hicks
Journal of Physical Chemistry A, vol. 104, 2000, page 8027.
4. Determination of the nitrogen atom density in the afterglow of a nitrogen and helium, non-equilibrium, atmospheric pressure plasma
Steven E. Babayan, Guowen Ding, and Robert F. Hicks
Plasma Chemistry and Plasma Processes, vol. 21, 2001, page 505.
5. Remote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressure
Gregory R. Nowling, Steven E. Babayan, Vladan Jankovic, and Robert F. Hicks
Plasma Sources Science and Technology, vol. 11, 2002, page 97.
6. Characterization of the Active Species in the Afterglow of a Nitrogen and Helium Atmospheric-Pressure Plasma
Steven E. Babayan, Guowen Ding, Gregory R. Nowling, Xiawan Yang, and Robert F. Hicks
Plasma Chemistry and Plasma Processes, vol. 22, 2002, page 255.
7. Measurement of the Fluorine Atom Concentration in a Carbon Tetrafluoride and Helium Atmospheric-Pressure Plasma
Xiawan Yang, Steven E. Babayan, and Robert F. Hicks
Plasma Sources Science and Technology, vol. 12, 2003, page 484.
8. Plasma Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon at Atmospheric Pressure Plasma
Maryam Moravej, Steven E. Babayan, Gregory R. Nowling, Xiawan Yang, and Robert F. Hicks
Plasma Sources Science and Technology, vol. 13, 2004, page 8.
9. Etching of Uranium Oxide with a Non-Thermal, Atmospheric Pressure Plasma
Xiawan Yang, Maryam Moravej, Steven E. Babayan, Gregory R. Nowling, and Robert F. Hicks
Journal of Nuclear Materials, vol. 324, 2004, page 134.
10. The Reactions of Silane in the Afterglow of a Helium-Nitrogen Plasma
Gregory R. Nowling, Steven E. Babayan, Xiawan Yang, Maryam Moravej, Ragesh Agrawal, and Robert F. Hicks
Plasma Sources Science and Technology, vol. 13, 2004, page 156.
10. The Reactions of Silane in the Afterglow of a Helium-Nitrogen Plasma
Gregory R. Nowling, Steven E. Babayan, Xiawan Yang, Maryam Moravej, Ragesh Agrawal, and Robert F. Hicks
Plasma Sources Science and Technology, vol. 13, 2004, page 156.
10. The Reactions of Silane in the Afterglow of a Helium-Nitrogen Plasma
Gregory R. Nowling, Steven E. Babayan, Xiawan Yang, Maryam Moravej, Ragesh Agrawal, and Robert F. Hicks
Plasma Sources Science and Technology, vol. 13, 2004, page 156.
10. The Reactions of Silane in the Afterglow of a Helium-Nitrogen Plasma
Gregory R. Nowling, Steven E. Babayan, Xiawan Yang, Maryam Moravej, Ragesh Agrawal, and Robert F. Hicks
Plasma Sources Science and Technology, vol. 13, 2004, page 156.
Conferences and Exhibitions
American Vacuum Society 51st International Symposium,
Anaheim, CA, November 14-19, 2004.
American Institute of Chemical Engineers, Annual Meeting,
Austin, TX, November 7-12, 2004
|
