Literature

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1. Surfx's "Application Notes" describing operating principles and uses of atmospheric pressure plasma sources, January, 2006.

2. Plasma-enhanced Chemical Vapor Deposition of Zinc Oxide at Atmospheric Pressure and Low Temperature

M.D. Barankin, E. Gonzalez II, A.M. Ladwig, R.F. Hicks, Solar Energy Materials and Solar Cells, Vol. 91, Issue 10, June 15, 2007, pages 924-930.

3. Atmospheric Plasma Deposition of Glass Coatings on Aluminum

A. Ladwig, S. Babayan, M. Smith, H. Hester, W. Highland, R. Koch, R. Hicks, Surface Coatings and Technology, vol. 201, 2007, page 6460.

4. Atmospheric Plasma Treatment of Polyetheretherkeytone Composites for Improved Adhesion

Hicks, R. F., Babayan, S. E., Penelon, J., Truong, Q., Cheng, S. F., Le, V. V., Ghilarducci, J., Hsieh, A. G., Deitzel, J. M., and Gillespie, J. W., "Atmospheric Plasma Treatment of Polyetheretherketone Composites for Improved Adhesion," SAMPE Fall Technical Conference Proceedings: Global Advances in Materials and Process Engineering, Dallas, TX, November 6-9, 2006, lCD-ROM pp. 9.

5. Environmental and biological applications of microplasmas
K. Becker, A. Koutsospyros, S.-M. Yin, C. Christodoulatos, N. Abramzon, J.C. Joaquin, and G. Brelles-Mariño, Plasma Physics and Controlled Fusion, vol. 47, 2005, page B513.

6. Properties of an atmospheric pressure radio-frequency argon and nitrogen plasma
Maryam Moravej, Xiawan Yang, Micha Barankin, Joel Penelon, Steven E. Babayan, Robert F. Hicks
Plasma Sources Science and Technology, vol. 15, 2006, page 204.

7. Atmospheric Plasma Deposition of Coatings using a Capacitive Discharge Source
Maryam Moravej and Robert F. Hicks
Chemical Vapor Deposition, vol. 11, 2005, page 469.

8. Chamberless Plasma Deposition of Glass Coatings on Plastic
Greg Nowling, Melanie Yajima, Steve Babayan, Maryam Moravej, Xiawan Yang, Bill Hoffman, and Robert Hicks
Plasma Sources Science and Technology, vol. 14, 2005, page 477.

9. High Stability of Atmospheric Pressure Plasmas Containing Carbon Tetrafluoride and Sulfur Hexafluoride
Xiawan Yang, Maryam Moravej, Steven E. Babayan, Gregory R. Nowling,  and Robert F. Hicks
Plasma Sources Science and Technology, vol. 14, 2005, page 412.

10. Comparison of an Atmospheric Pressure, Radio-Frequency Discharge Operating in the a and b Modes
Xiawan Yang, Maryam Moravej, Gregory R. Nowling, Steven E. Babayan, Joel Penelon, Jane P. Chang and Robert F. Hicks
Plasma Sources Science and Technology, vol. 14, 2005, page 314.

11. Operating Modes of an Atmospheric Pressure Radio-Frequency Plasma
Xiawan Yang, Maryam Moravej, Gregory R. Nowling, Jane P. Chang and Robert F. Hicks
4th Triennial Special Issue of the IEEE Transactions in Plasma Science, vol. 33, 2005, page 294.

12. Physics of high-pressure helium and argon radio-frequency plasmas
Maryam Moravej, Steven E. Babayan, Xiawan Yang, Gregory R. Nowling, and Robert F. Hicks
Journal of Applied Physics, vol. 96, 2004, page 7011.

13. The Reactions of Silane in the Afterglow of a Helium-Nitrogen Plasma
Gregory R. Nowling, Steven E. Babayan, Xiawan Yang, Maryam Moravej, Ragesh Agrawal, and Robert F. Hicks
Plasma Sources Science and Technology, vol. 13, 2004, page 156.

14. Plasma Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon at Atmospheric Pressure Plasma
Maryam Moravej, Steven E. Babayan, Gregory R. Nowling, Xiawan Yang, and Robert F. Hicks
Plasma Sources Science and Technology, vol. 13, 2004, page 8.

15. Etching of Uranium Oxide with a Non-Thermal, Atmospheric Pressure Plasma
Xiawan Yang, Maryam Moravej, Steven E. Babayan, Gregory R. Nowling, and Robert F. Hicks
Journal of Nuclear Materials, vol. 324, 2004, page 134.

16. Measurement of the Fluorine Atom Concentration in a Carbon Tetrafluoride and Helium Atmospheric-Pressure Plasma
Xiawan Yang, Steven E. Babayan, and Robert F. Hicks
Plasma Sources Science and Technology, vol. 12, 2003, page 484.

17. Characterization of the Active Species in the Afterglow of a Nitrogen and Helium Atmospheric-Pressure Plasma
Steven E. Babayan, Guowen Ding, Gregory R. Nowling, Xiawan Yang, and Robert F. Hicks
Plasma Chemistry and Plasma Processes, vol. 22, 2002, page 255.

18. Remote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressure
Gregory R. Nowling, Steven E. Babayan, Vladan Jankovic, and Robert F. Hicks
Plasma Sources Science and Technology, vol. 11, 2002, page 97.

19. Determination of the nitrogen atom density in the afterglow of a nitrogen and helium, non-equilibrium, atmospheric pressure plasma
Steven E. Babayan, Guowen Ding, and Robert F. Hicks
Plasma Chemistry and Plasma Processes, vol. 21, 2001, page 505.

20. Reaction chemistry in the afterglow of an oxygen-helium, atmospheric-pressure plasma
James Y. Jeong, Jaeyoung Park, Ivars Henins, Steven E. Babayan, Vincent J. Tu, Gary S. Selwyn, Guowen Ding, and Robert F. Hicks
Journal of Physical Chemistry A, vol. 104, 2000, page 8027.